65 nm process65 nm process
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What Wikipedia says
The 65 nm process is an advanced lithographic node used in volume CMOS (MOSFET) semiconductor fabrication. Printed linewidths (i.e. transistor gate lengths) can reach as low as 25 nm on a nominally 65 nm process, while the pitch between two lines may be greater than 130 nm.
Excerpt from the Wikipedia article “65 nm process”, under the CC BY-SA 4.0 license. Read the article on Wikipedia
Image: Henriok, CC0, via Wikimedia Commons.
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