Electron-beam lithographyElectron-beam lithography
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What Wikipedia says
Electron-beam lithography (often abbreviated as e-beam lithography or EBL) is the practice of scanning a focused beam of electrons to draw custom shapes on a surface covered with an electron-sensitive film called a resist (exposing).
Excerpt from the Wikipedia article “Electron-beam lithography”, under the CC BY-SA 4.0 license. Read the article on Wikipedia
Image: LZ, CC0, via Wikimedia Commons.
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